BuyChemJapan
>
BuyChemJapan Corporation
>
Sputtering Targets Cu-35Ni-3Ti

Sputtering Targets Cu-35Ni-3Ti

Thin Film Materials

Sumitomo Metal Mining Co., Ltd.

Product Overview

General Name

Thin Film Materials

Product / Grade Name

Sputtering Targets Cu-35Ni-3Ti

Maker Name

Sumitomo Metal Mining Co., Ltd.

End Use(s)

  • Display Device

Hazard Classification

  • UN Number

    :

  • IMGD Class

    :

  • Packing Group

    :

More from this maker

Copper Powder

Copper

Produced by Sumitomo Metal Mining Co., Ltd.

 

Electrolytic Copper

Copper

Produced by Sumitomo Metal Mining Co., Ltd.

 

Oxidation-resistant Submicron Copper Powder UCP-030N

Copper

Produced by Sumitomo Metal Mining Co., Ltd.

 

Rolled Copper Foil Copper alloy

Copper

Produced by Sumitomo Metal Mining Co., Ltd.

 

Rolled Copper Foil Oxygen-free Copper : C1020R

Copper

Produced by Sumitomo Metal Mining Co., Ltd.

 

Sputtering Targets Cu-35Ni-3Ti

Thin Film Materials

Sumitomo Metal Mining Co., Ltd.