SWK-EX4
Reflective Multilayer Materials
Produced by Tokyo Ohka Kogyo Co., Ltd.
SWK-T7
TARF-P6111
Positive Arf Resist for Lines
TARF-P7052
Positive Arf Resist for Holes
TCIR-ZR8800
Deep Dry Etching Resist
TDUR-P3435
Positive Krf Resist for Lines
TDUR-P4197T PM
Positive Krf Resist for Holes
TDUR-P802
Krf Positive Wet Etching Photoresist Resist
TDUR-P9001 CO
Thick Film Krf Resist
TFR-DI750
Display Photoresist for Wiring Patterning
THMR-IP5700
G-Line Positive Wet Etching Photoresist
TLAL
Low Refractive Index Coating Materials
TLDP-300
Specialized for Protective Film during Laser Processing
TLOR-N001PM
Negative Photoresists for Lift-Off
TLOR-P003HP
Posittive Photoresists for Lift-Off
TMMR NA1000PM
Photosensitive Dry Film Liquid Type
TMMR P-W1000T
NQD-Based High-Resolution RDL Forming Photoresist
TMR-P15 PM
Transparent Structure Forming Material Thermal Flow Type
TPF
High Purity Water-Soluble Resin Solution
TSMR-CR57i10
I-Line Positive Photoresist
TSMR-iN080
I-Line Negative Wet Etching Photoresist
TSMR-V90
G-Line Positive Photoresist High-Resolution Rectangular Shape
TSP-EX3002A
TSP-IL2600C
Reflective Multilayer Materials Non-PFOS Type
Hydrofluoric Acid
Produced by Tama Chemicals Co., Ltd.
500 g net
TAMAPURE-AA-100 HF
TAMAPURE-AA-10 HF
TAMAPURE-AA SSX
Hydrofluoric Acid, Hydrogen Peroxide
TAMAPURE-AA-100 H2O2
Hydrogen Peroxide
TAMAPURE-AA-10 H2O2
4891–4920 of 8801 results
