OFPR-8600
G-Line Positive Photoresist High Heat-Resistant Type
Produced by Tokyo Ohka Kogyo Co., Ltd.
OMR-100
Rubber-Based Negative Wet Etching Photoresist
PBF
Boron Diffusion Coating Solutions
PMER P-BZ2000
Bump Formation Resist for Photobumping
PMER P-BZ4000
PMER P-CP50
Photoresist for Redistribution Layer (Rdl) Plating
PMER P-CY1000
Deep Dry Etching Resist
SST-A2
Water-Soluble Stripping Solution for Deposited Materials
ST-120
Stripping Solution for Thick Films
SWK-EX4
Reflective Multilayer Materials
SWK-T7
TARF-P6111
Positive Arf Resist for Lines
TARF-P7052
Positive Arf Resist for Holes
TCIR-ZR8800
TDUR-P3435
Positive Krf Resist for Lines
TDUR-P4197T PM
Positive Krf Resist for Holes
TDUR-P802
Krf Positive Wet Etching Photoresist Resist
TDUR-P9001 CO
Thick Film Krf Resist
TFR-DI750
Display Photoresist for Wiring Patterning
THMR-IP5700
G-Line Positive Wet Etching Photoresist
TLOR-N001PM
Negative Photoresists for Lift-Off
TLOR-P003HP
Posittive Photoresists for Lift-Off
TMMR NA1000PM
Photosensitive Dry Film Liquid Type
TMMR P-W1000T
NQD-Based High-Resolution RDL Forming Photoresist
TSMR-CR57i10
I-Line Positive Photoresist
TSMR-iN080
I-Line Negative Wet Etching Photoresist
TSMR-V90
G-Line Positive Photoresist High-Resolution Rectangular Shape
TSP-EX3002A
TSP-IL2600C
Reflective Multilayer Materials Non-PFOS Type
1,2,3-Trimethoxybenzene
Produced by Tsujimoto Chemical Co., Ltd.
In craft+plastic bag of 20 kg net
4951–4980 of 9687 results
